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Review of Scientific Instruments / Volume 82 / Issue 12 / ARTICLES / Microscopy and Imaging

Rev. Sci. Instrum. 82, 123704 (2011); http://dx.doi.org/10.1063/1.3669774 (8 pages)

A combined scanning tunneling microscope–atomic layer deposition tool

James F. Mack1, Philip B. Van Stockum2, Hitoshi Iwadate3, and Fritz B. Prinz4

1Department of Mechanical Engineering, Stanford University, Stanford, California 94305, USA
2Department of Physics, Stanford University, Stanford, California 94305, USA
3Honda Research Institute USA, Mountain View, California 94043, USA
4Departments of Mechanical Engineering and Materials Science, Stanford University, Stanford, California 94305, USA

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(Received 14 September 2011; accepted 23 November 2011; published online 14 December 2011)

We have built a combined scanning tunneling microscope–atomic layer deposition (STM-ALD) tool that performs in situ imaging of deposition. It operates from room temperature up to 200 °C, and at pressures from 1 × 10−6 Torr to 1 × 10−2 Torr. The STM-ALD system has a complete passive vibration isolation system that counteracts both seismic and acoustic excitations. The instrument can be used as an observation tool to monitor the initial growth phases of ALD in situ, as well as a nanofabrication tool by applying an electric field with the tip to laterally pattern deposition. In this paper, we describe the design of the tool and demonstrate its capability for atomic resolution STM imaging, atomic layer deposition, and the combination of the two techniques for in situ characterization of deposition.

© 2011 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. OVERALL ARCHITECTURE
    1. Partitioned vacuum chamber
    2. Vacuum performance
  3. ALD SUBSYSTEM
  4. STM SUBSYSTEM
    1. Commercial components
    2. Customized components
    3. System stability
  5. VIBRATION ISOLATION
    1. Seismic isolation
    2. Acoustic isolation
  6. EXPERIMENTAL VERIFICATION
    1. ALD performance
    2. STM performance
    3. In situ STM of ALD
  7. ADDITIONAL CAPABILITIES FOR FUTURE WORK

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KEYWORDS and PACS

Keywords

atomic layer deposition, electric fields, nanofabrication, scanning tunnelling microscopy, vibration isolation

PACS

  • 07.79.Cz

    Scanning tunneling microscopes

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3669774

PUBLICATION DATA

ISSN

0034-6748 (print)  
1089-7623 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
    L. Baker, A. S. Cavanagh, D. Seghete, S. M. George, A. J.M. Mackus, W. M.M. Kessels, Z. Y. Liu, and F. T. Wagner, J. Appl. Phys. 109, 084333 (2011)JAPIAU000109000008084333000001.

    J. W. Elam, M. D. Groner, and S. M. George, Rev. Sci. Instrum. 73, 2981 (2002)RSINAK000073000008002981000001.

    P. Muralt and D. W. Pohl, Appl. Phys. Lett. 48, 514 (1986)APPLAB000048000008000514000001.

    M. Rozler and M. R. Beasley, Rev. Sci. Instrum. 79, 073904 (2008)RSINAK000079000007073904000001.

    N. P. Dasgupta, J. F. Mack, M. C. Langston, A. Bousetta, and F. B. Prinz, Rev. Sci. Instrum. 81, 044102 (2010)RSINAK000081000004044102000001.


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