RSI Nameplate
  • Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

Flickr Twitter iResearch App Facebook

BROWSE VOLUMES

Year Range: 
Search Issue | RSS Feeds RSS
Previous Issue Next Issue

Aug 2010

Volume 81, Issue 8, Articles (08xxxx)

Issue Cover Spotlight Figure

Rev. Sci. Instrum. 81, 081101 (2010); http://dx.doi.org/10.1063/1.3480478 (24 pages)

Francis Halzen and Spencer R. Klein

Aerial view of the geographic South Pole with the NSF's research station (left side of the picture) and the IceCube project separated by the runway for ski-equipped aircraft. The inset shows a kilometer-long track of light radiated by a 100 TeV neutrino-induced muon in the ice instrumented at depths of 1.5 to 2.5 km.  (Forest Banks, photo credit)

Enlarge Image | Read More
Return to All Sections
back to top
RSS Feeds
back to top Particle Sources, Optics and Acceleration; Particle Detectors

Design and characterization of 2.45 GHz electron cyclotron resonance plasma source with magnetron magnetic field configuration for high flux of hyperthermal neutral beam

Seong Bong Kim, Dae Chul Kim, Won Namkung, Moohyun Cho, and Suk Jae Yoo

Rev. Sci. Instrum. 81, 083301 (2010); http://dx.doi.org/10.1063/1.3477998 (6 pages) | Cited 1 time

Online Publication Date: 26 August 2010

Full Text: Read Online (HTML) | Download PDF

Show Abstract
A 2.45 GHz electron cyclotron resonance (ECR) source with a magnetron magnetic field configuration was developed to meet the demand of a hyperthermal neutral beam (HNB) flux on a substrate of more than 1×1015 cm−2 s−1 for industrial applications. The parameters of the operating pressure, ion density, electron temperature, and distance between the neutralization plate and the substrate for the HNB source are specified in a theoretical analysis. The electron temperature and the ion density are measured to characterize the ECR HNB source using a Langmuir probe and optical emission spectroscopy. The parameters of the ECR HNB source are in good agreement with the theoretically specified parameters.
Show PACS
52.50.Dg Plasma sources
52.25.Fi Transport properties
52.50.Qt Plasma heating by radio-frequency fields; ICR, ICP, helicons
52.70.Ds Electric and magnetic measurements
52.70.Kz Optical (ultraviolet, visible, infrared) measurements

High homogeneity 25 cm low-energy rf ion source with inherent electron compensation

S. V. Dudin, D. V. Rafalskyi, and A. V. Zykov

Rev. Sci. Instrum. 81, 083302 (2010); http://dx.doi.org/10.1063/1.3477999 (6 pages) | Cited 4 times

Online Publication Date: 31 August 2010

Full Text: Read Online (HTML) | Download PDF

Show Abstract
A 25 cm single-grid low-energy rf ion source with inherent electron compensation is described and characterized. Measurements were carried out using Ar and CF4 filling gas. The dependence of the ion beam current to the target as well as the current partition between the beam fast and slow ions on the rf discharge pressure for both filling gases is discussed. The unique ability of generation of coinciding ion and electron flows is demonstrated and the measured ion and electron energy distribution functions are presented as well. The developed broad ion beam source is able of providing 0.5–5 mA/cm2 current density in the low ion energy range of 50–250 eV, with possibility of independent current density and energy control. It is shown that complementing the rf plasma source with a profiling electrode allows for CF4 ion source operation attaining ±5% ion beam uniformity over 250 mm in diameter. The presented CF4 etching test results exhibit the possibility of highly directional anisotropic Si and SiO2 etching utilizing the developed single grid rf ion source.
Show PACS
07.77.Ka Charged-particle beam sources and detectors
52.50.Dg Plasma sources
52.80.Pi High-frequency and RF discharges
52.77.Bn Etching and cleaning
81.65.Cf Surface cleaning, etching, patterning
Return to All Sections
Close

Google Calendar

ADVERTISEMENT

Go to AIP Home   © AIP Publishing LLC
close