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Rev. Sci. Instrum. 81, 073108 (2010); http://dx.doi.org/10.1063/1.3460267 (7 pages)

Tunable ultrafast extreme ultraviolet source for time- and angle-resolved photoemission spectroscopy

G. L. Dakovski1, Y. Li2, T. Durakiewicz2, and G. Rodriguez1

1MPA-CINT, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USA
2MPA-CMMS, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USA

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(Received 6 May 2010; accepted 14 June 2010; published online 20 July 2010)

We present a laser-based apparatus suitable for visible pump/extreme UV (XUV) probe time-, energy-, and angle-resolved photoemission spectroscopy utilizing high-harmonic generation from a noble gas. Tunability in a wide range of energies (currently 20–36 eV) is achieved by using a time-delay compensated monochromator, which also preserves the ultrashort duration of the XUV pulses. Using an amplified laser system at 10 kHz repetition rate, approximately 109–1010 photons/s per harmonic are made available for photoelectron spectroscopy. Parallel energy and momentum detection is carried out in a hemispherical electron analyzer coupled with an imaging detector. First applications demonstrate the capabilities of the instrument to easily select the probe wavelength of choice, to obtain angle-resolved photoemission maps (GaAs and URu2Si2), and to trace ultrafast electron dynamics in an optically excited semiconductor (Ge).

© 2010 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. EXPERIMENTAL SETUP
    1. XUV light source
    2. Time-delay compensated monochromator
    3. Differential pump and UHV target chamber
  3. PHOTOEMISSION MEASUREMENTS USING SINGLE HARMONICS
  4. ARPES USING HIGH HARMONICS
  5. TIME-RESOLVED PHOTOEMISSION
  6. CONCLUSIONS AND OUTLOOK

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KEYWORDS and PACS

PACS

  • 07.81.+a

    Electron and ion spectrometers

  • 42.65.Ky

    Frequency conversion; harmonic generation, including higher-order harmonic generation

  • 79.60.Bm

    Clean metal, semiconductor, and insulator surfaces

ARTICLE DATA

PUBLICATION DATA

ISSN

0034-6748 (print)  
1089-7623 (online)

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