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Review of Scientific Instruments / Volume 79 / Issue 10 / NUCLEAR PHYSICS, FUSION AND PLASMAS

Rev. Sci. Instrum. 79, 103502 (2008); http://dx.doi.org/10.1063/1.2999904 (5 pages)

Diagnosis of high-intensity pulsed heavy ion beam generated by a novel magnetically insulated diode with gas puff plasma gun

H. Ito, H. Miyake, and K. Masugata

Department of Electrical and Electronic Engineering, University of Toyama, 3190 Gofuku, Toyama 930-8555, Japan

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(Received 16 June 2008; accepted 21 September 2008; published online 15 October 2008)

Intense pulsed heavy ion beam is expected to be applied to materials processing including surface modification and ion implantation. For those applications, it is very important to generate high-purity ion beams with various ion species. For this purpose, we have developed a new type of a magnetically insulated ion diode with an active ion source of a gas puff plasma gun. When the ion diode was operated at a diode voltage of about 190 kV, a diode current of about 15 kA, and a pulse duration of about 100 ns, the ion beam with an ion current density of 54 A/cm2 was obtained at 50 mm downstream from the anode. By evaluating the ion species and the energy spectrum of the ion beam via a Thomson parabola spectrometer, it was confirmed that the ion beam consists of nitrogen ions (N+ and N2+) of energy of 100–400 keV and the proton impurities of energy of 90–200 keV. The purity of the beam was evaluated to be 94%. The high-purity pulsed nitrogen ion beam was successfully obtained by the developed ion diode system.

© 2008 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. EXPERIMENTAL APPARATUS
  3. EXPERIMENTAL RESULT AND DISCUSSION

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KEYWORDS and PACS

Keywords

ion implantation, nitrogen, plasma diagnostics, plasma guns

PACS

  • 52.77.Dq

    Plasma-based ion implantation and deposition

  • 52.70.-m

    Plasma diagnostic techniques and instrumentation

  • 52.50.-b

    Plasma production and heating

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.2999904

PUBLICATION DATA

ISSN

0034-6748 (print)  
1089-7623 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
    K. Yatsui, X. D. Kang, T. Sonegawa, T. Matsuoka, K. Masugata, Y. Shimotori, T. Satoh, S. Furuuchi, Y. Ohuchi, T. Takeshita, and H. Yamamoto, Phys. Plasmas 1, 1730 (1994)PHPAEN000001000005001730000001.

    G. P. Johnston, P. Tiwari, D. J. Rej, H. A. Davis, W. J. Waganaar, R. E. Muenchausen, K. C. Walter, M. Nastasi, H. K. Schmidt, N. Kumar, B. Lin, D. R. Tallant, R. L. Simpson, D. B. Williams, and X. Qiu, J. Appl. Phys. 76, 5949 (1994)JAPIAU000076000010005949000001.

    D. J. Rej, R. R. Bartsch, H. A. Davis, R. J. Faehl, J. B. Greenly, and W. J. Waganaar, Rev. Sci. Instrum. 64, 2753 (1993)RSINAK000064000010002753000001.

    X. P. Zhu, M. K. Lei, and T. C. Ma, Rev. Sci. Instrum. 73, 1728 (2002)RSINAK000073000004001728000001.

    K. Masugata, H. Okuda, K. Yatsui, and T. Tazima, J. Appl. Phys. 80, 4813 (1996)JAPIAU000080000009004813000001.

    D. W. Swain, S. A. Goldstein, I. P. Mix, J. G. Kelly, and G. R. Hadley, J. Appl. Phys. 48, 1085 (1977)JAPIAU000048000003001085000001.

    H. Ito, K. Igawa, I. Kitamura, and K. Masugata, Rev. Sci. Instrum. 78, 013502 (2007)RSINAK000078000001013502000001.


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