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Review of Scientific Instruments / Volume 79 / Issue 10 / OPTICS; ATOMS AND MOLECULES; SPECTROSCOPY; PHOTON DETECTORS

Rev. Sci. Instrum. 79, 103108 (2008); http://dx.doi.org/10.1063/1.2999543 (7 pages)

Extreme-ultraviolet polarimeter utilizing laser-generated high-order harmonics

Nicole Brimhall, Matthew Turner, Nicholas Herrick, David D. Allred, R. Steven Turley, Michael Ware, and Justin Peatross

Department of Physics and Astronomy, Brigham Young University, Provo, Utah 84602, USA

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(Received 24 March 2008; accepted 17 September 2008; published online 27 October 2008)

We describe an extreme-ultraviolet (EUV) polarimeter that employs laser-generated high-order harmonics as the light source. The polarimeter is designed to characterize materials and thin films for use with EUV light. Laser high harmonics are highly directional with easily rotatable linear polarization, not typically available with other EUV sources. The harmonics have good wavelength coverage, potentially spanning the entire EUV from a few to a hundred nanometers. Our instrument is configured to measure reflectances from 14 to 30 nm and has ∼ 180 spectral resolution (λ/Δλ). The reflection from a sample surface can be measured over a continuous range of incident angles (5°–75°). A secondary 14 cm gas cell attenuates the harmonics in a controlled way to keep signals within the linear dynamic range of the detector, comprised of a microchannel plate coupled to a phosphorous screen and charge coupled device camera. The harmonics are produced using ∼ 10 mJ, ∼ 35 fs, and ∼ 800 nm laser pulses with a repetition rate of 10 Hz. Per-shot energy monitoring of the laser discriminates against fluctuations. The polarimeter reflectance data agree well with data obtained at the Advanced Light Source Synchrotron (Beamline 6.3.2).

© 2008 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. HIGH HARMONIC EUV LIGHT SOURCE
  3. POLARIMETER DESIGN
    1. Positioning system
    2. Alignment diagnostic
    3. Determination of orders
    4. Spectral resolution
    5. Controlled harmonic attenuation
    6. Laser power discriminator
  4. REFLECTANCE MEASUREMENTS
  5. CONCLUSIONS

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KEYWORDS and PACS

Keywords

CCD image sensors, materials testing, measurement by laser beam, microchannel plates, optical harmonic generation, polarimetry, reflectivity, ultraviolet sources

PACS

  • 81.70.Fy

    Nondestructive testing: optical methods

  • 07.60.Fs

    Polarimeters and ellipsometers

  • 42.62.Eh

    Metrological applications; optical frequency synthesizers for precision spectroscopy

  • 42.72.Bj

    Visible and ultraviolet sources

  • 42.65.Ky

    Frequency conversion; harmonic generation, including higher-order harmonic generation

  • 42.79.Pw

    Imaging detectors and sensors

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.2999543

PUBLICATION DATA

ISSN

0034-6748 (print)  
1089-7623 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
    D. Schulze, M. Dorr, G. Sommerer, J. Ludwig, P. Nickles, T. Schlegel, W. Sandner, M. Drescher, U. Kleineberg, and U. Heinzmann, Phys. Rev. A 57, 3003 (1998).

    A. L'Huillier and P. Balcou, Phys. Rev. Lett. 70, 774 (1993).

    E. Takahashi, Y. Nabekawa, T. Otsuka, M. Obara, and K. Midorikawa, Phys. Rev. A 66, 021802 (2002).


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