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Rev. Sci. Instrum. 76, 073304 (2005); http://dx.doi.org/10.1063/1.1948396 (6 pages)

Low jitter metal vapor vacuum arc ion source for electron beam ion trap injections

Glenn E. Holland1, Craig N. Boyer2, John F. Seely3, J. N. Tan4, J. M. Pomeroy4, and J. D. Gillaspy4

1SFA Inc., 2200 Defense Highway, Suite 405, Crofton, Maryland 21114
2Praxis Inc., 2200 Mill Road, Alexandria, Virginia 22314
3Naval Research Laboratory, Washington, DC 20375
4National Institute of Standards and Technology, Gaithersburg, Maryland 20899

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(Received 22 February 2005; accepted 18 May 2005; published online 27 June 2005)

We describe a metal vapor vacuum arc (MeVVA) ion source containing eight different cathodes that are individually selectable via the control electronics which does not require moving components in vacuum. Inside the vacuum assembly, the arc plasma is produced by means of a 30 μs pulse (26 kV,125 A) delivering 2.4 mC of charge to the cathode sample material. The trigger jitter is minimized (<200 ns) to improve the capture efficiency of the ions which are injected into an ion trap. During a single discharge, the over-damped pulse produces an ion flux of 8.4×109 ions/cm2, measured by an unbiased Faraday cup positioned 20 cm from the extractor grid, at discharge rates up to 5 Hz. The electronic triggering of the discharge is via a fiber optic interface. We present the design, fabrication details, and performance of this MeVVA, recently installed on the National Institute of Standards and Technology electron beam ion trap (EBIT).

© 2005 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. MeVVA SYSTEM OVERVIEW
  3. MeVVA ELECTRONICS DESIGN
  4. MeVVA HEAD DESIGN
  5. ION PRODUCTION
  6. DATA OBTAINED AT NIST EBIT
  7. DISCUSSION

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KEYWORDS and PACS

PACS

  • 52.80.Mg

    Arcs; sparks; lightning; atmospheric electricity

  • 52.80.Vp

    Discharge in vacuum

  • 52.50.Dg

    Plasma sources

  • 52.70.-m

    Plasma diagnostic techniques and instrumentation

ARTICLE DATA

PUBLICATION DATA

ISSN

0034-6748 (print)  
1089-7623 (online)

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