RSI Nameplate
  • Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

Flickr Twitter iResearch App Facebook

BROWSE VOLUMES

Year Range: 
Search Issue | RSS Feeds RSS
Next Issue

Jan 2005

Volume 76, Issue 1, Articles (01xxxx)

Return to All Sections
back to top
RSS Feeds

Noise resolution of RuO2-based resistance thermometers

Piotr Ptak, Andrzej Kolek, Zbigniew Zawislak, Adam W. Stadler, and Krzysztof Mleczko

Rev. Sci. Instrum. 76, 014901 (2005); http://dx.doi.org/10.1063/1.1834704 (6 pages) | Cited 5 times

Online Publication Date: 22 December 2004

Full Text: Read Online (HTML) | Download PDF

Show Abstract
Low-frequency noise was measured for RuO2-based thick film resistors at liquid helium temperatures down to 0.36 K. The 1/f-type spectrum and squared voltage dependence of power spectral density observed at low voltages attribute the noise as coming from equilibrium resistance fluctuations. Measurements carried out at different temperatures show that the magnitude of noise intensity (index) increases significantly as temperature goes down. Due to this fact, the resolution of RuO2 thermometers increases above the instrument resolution. The quantity which describes a sensor resolution is defined and calculated for RuO2 thick film sensor. Some remarks on measurement strategy and sensor optimization are supplied.
Show PACS
07.20.Dt Thermometers
84.32.Ff Conductors, resistors (including thermistors, varistors, and photoresistors)
72.70.+m Noise processes and phenomena
Return to All Sections
Close

Google Calendar

ADVERTISEMENT

Go to AIP Home   © AIP Publishing LLC
close