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Feb 2000

Volume 71, Issue 2, pp. 335-1239

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back to top PLENARY SESSION

Heavy-ion sources: The Star, or the Cinderella, of the ion-implantation firmament? (invited)

Harry Freeman

Rev. Sci. Instrum. 71, 603 (2000); http://dx.doi.org/10.1063/1.1150330 (9 pages) | Cited 4 times

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The Star, because of the invaluable contribution which the heavy-ion source has already made to the successful development of semiconductor implantation. And the Star, too, because it is evident that the key characteristics of such sources, which are now used on a quite routine industrial basis—their reliability, their ease of operation and, above all, their extraordinary versatility—have still not been fully exploited. This ensures that there is still scope, at least in the short term, for further optimization, which will go some way to meet the increasingly stringent industrial doping requirements. The Cinderella, because of my belief that these heavy-ion sources have now contributed to the successful operation of ion implanters so well, and for so long, that their present level of performance is mistakenly taken for granted. The result has been a paucity of meaningful research and development. Despite this, in this article I aim to show that, like Cinderella, who was so neglected that her true merit was long overlooked, there is the prospect too of achieving the significantly larger improvements in beam quality which the semiconductor industry will eventually be seeking. © 2000 American Institute of Physics.
Show PACS
07.77.Ka Charged-particle beam sources and detectors
85.40.Ry Impurity doping, diffusion and ion implantation technology
41.85.Ar Particle beam extraction, beam injection
29.25.Ni Ion sources: positive and negative
01.30.Rr Surveys and tutorial papers; resource letters
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