The overall performance of both a single‐ and a double‐microchannel plate framing camera were measured. In the case of the double‐plated device, only the front plate was gated. A short‐pulse, 20‐ps full width half‐maximum (FWHM), uv laser was used to create photoelectrons on a time scale rapid compared to the temporal variation of the high‐voltage gate pulse (965 V peak amplitude and 270 ps FWHM). Measurements were made of the variation in the light output pulse amplitude (8%–24%), width (85–115 ps), and peak location (±22 ps), the latter corresponding to a temporal jitter. It was found that when a dc bias was applied to the plate (in addition to the high‐voltage pulse) the output signal increased as the dc bias to the 13 and 5.2 powers, below and above a bias of 450 V, respectively, and a factor of 20 difference in signal between the single‐ and double‐plate cameras. It was also determined that the rejection ratio drops from 500 to 1300 at a bias value of 450 V to 125–190 at 650 V.