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Dec 1975

Volume 46, Issue 12, pp. 1615-1712

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Laser‐triggered spark gap and Kerr cell shutter using a low impedance transmission line

J.‐C. Diels

Rev. Sci. Instrum. 46, 1704 (1975); http://dx.doi.org/10.1063/1.1134123 (3 pages) | Cited 1 time

Online Publication Date: 2 September 2008

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Kerr cells driven by 50 Ω impedance circuits are generally risetime limited due to the capacitance of the cell. Faster risetimes may be achieved with lower impedance circuits. However, the lower the impedance, the more reflections occur at the localized elements and the higher the electric fields in the insulation. These two technical difficulties have been overcome here for Z0=1.5 Ω and Z0=2.5 Ω characteristic impedance parallel plate transmission lines. An impedance matched distributed resistance provided a reflection‐free termination for the circuit.
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42.79.Hp Optical processors, correlators, and modulators
42.79.Fm Reflectors, beam splitters, and deflectors
42.79.Ls Scanners, image intensifiers, and image converters
42.62.-b Laser applications
06.60.Jn High-speed techniques (microsecond to femtosecond)

Flyer plate adhesion tests for copper and nickel plated A286 stainless steel

J. W. Dini and H. R. Johnson

Rev. Sci. Instrum. 46, 1706 (1975); http://dx.doi.org/10.1063/1.1134149 (2 pages) | Cited 1 time

Online Publication Date: 2 September 2008

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Flyer plate shock wave tests were used to evaluate the influence of using an intermediate copper electrodeposited coating on A286 stainless steel prior to plating to final thickness with nickel. Neither varying the copper plating solution (cyanide or pyrophosphate) nor the deposit thickness from 0.008 to 0.084 mm affected the adhesion as measured by this work.
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81.65.Cf Surface cleaning, etching, patterning
81.65.Ps Polishing, grinding, surface finishing
46.55.+d Tribology and mechanical contacts

Trap current regulated ion source power supply for a mass spectrometer

Jehuda Yinon and Moshe Ganz

Rev. Sci. Instrum. 46, 1707 (1975); http://dx.doi.org/10.1063/1.1134119 (2 pages)

Online Publication Date: 2 September 2008

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A simple trap current regulated ion source power supply for an isotope ratio mass spectrometer has been built, consisting mainly of commercially available voltage power supplies. Short term stability of 0.01% has been obtained with this system.
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07.75.+h Mass spectrometers

Dynamic high pressure seal for low temperatures

Jaime O. Chua, Robert E. Terry, and Arthur L. Ruoff

Rev. Sci. Instrum. 46, 1708 (1975); http://dx.doi.org/10.1063/1.1134120 (2 pages) | Cited 2 times

Online Publication Date: 2 September 2008

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A dynamic high pressure seal is described which operates successfully for numerous cycles to 7 kilobar at liquid nitrogen temperature with helium gas as the pressure medium.
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07.35.+k High-pressure apparatus; shock tubes; diamond anvil cells
07.20.Mc Cryogenics; refrigerators, low-temperature detectors, and other low-temperature equipment

Glow discharge source of H− ions

R. A. Rhodes II, W. F. Block, and B. G. Wallace

Rev. Sci. Instrum. 46, 1710 (1975); http://dx.doi.org/10.1063/1.1134121 (1 page)

Online Publication Date: 2 September 2008

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A simple glow discharge source of H− ions has been built that has the advantages but not the disadvantages of the hot cathode type. The maximum stable current produced by this source was 8.8×10−9 A. The source was also found to produce stable currents of H+, H2+, and H3+ at the same order of magnitude as that of the H− ions.
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52.80.Hc Glow; corona
29.25.Lg Ion sources: polarized
29.25.Ni Ion sources: positive and negative

Voltage focusing of a telefocus electron gun

V. K. Rasmussen

Rev. Sci. Instrum. 46, 1711 (1975); http://dx.doi.org/10.1063/1.1134122 (2 pages) | Cited 2 times

Online Publication Date: 2 September 2008

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An electron gun based on Steigerwald’s design is described. It is of particular interest in that large changes in the cathode to focus distance can be effected by changing the voltage on one electrode, which operates at moderate voltages with respect to the cathode.
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41.75.Fr Electron and positron beams
29.25.-t Particle sources and targets
29.27.-a Beams in particle accelerators
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